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MicroWriter - the new laser lithography system
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The MicroWriter is our new laser lithography system which offers everything a researcher will needs to perform laser lithography experiments. The system consists of fifteen 405 nm lasers which are operating in parallel (each is able to access a wafer area of 200 mm x 10 mm) set for a resolution of 5 µm. In addition the system will have one 405 nm laser able to access all parts of the wafer and set for a resolution of 1 µm with independent autofocus and CCD camera. Beside this standard configuration the system can be equipped with a high resolution 405 nm laser that offers 0.6 µm writing resolution, a ultrahigh resolution laser (0.4 µm resolution/405 nm), UV writing (375 nm / 1 µm resolution) or high speed writing option (2 µm resolution / 405 nm).
The maximum substrate size is 230 x 230 mm² and the substrate held in place by a vacuum chuck. The write area is 200 x 200 mm² and it can be written asa single write field, i.e without stitching. The minimum structure size is 600 nm with the high resolution option and 1 µm with the standard configuration.
The main highlight of the system is the writing speed due to the fifteen lasers plus the one high resolution laser. On a standard resists across 200 mm square writing area we have a writing speed of:
 | 5 µm resolution lasers: 25 mm2/minute per laser → 15 x 25 mm2/minute = 375 mm2/minute combined writing speed.
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| 1 µm resolution laser: 4 mm2/minute
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| 0.6 µm resolution laser: 3 mm2/minute
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| 2 µm resolution laser: 8 mm2/minute |
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